DRY FILM STRIPPER
Model: GIM-1201
Category: Chemicals for Photo Litho Process
Exhibitor: AMIA CO., LTD. | PERSEE CHEMICAL CO., LTD.
Booth No: TBA
Characteristic
1.The removable liquid or semi-liquid state dry film, and the alkali-soluble ink. 2.Can be used in difficult stripping the photoresist, and may obtain a finer ink crumbs. 3.Remove photoresist; self-Over-plated Circuits has the the excellent stripped ability and high stripping rate, can be used for high-speed horizontal. 4.GIM-1201 formula contains the antirust and antifouling Point ingredients, can help prevent copper surface attack AOI inspection. 5.GIM-1201 can be used in Batch mode, when the bite fast saturation GIM-1201, if necessary, you can add the appropriate defoamers.
Other Products
-
Auto-Alignment Collimated Exposure Units (for Outer/Inner layer)
-
Copper Solution MC
-
V-Bond Treatment M/C
-
UV CURING MACHINE
-
Soldring
-
Acid/Alkaline Etching Waste Liquid Copper Recovery System
-
Aluminum Lubrication Entry Sheet
-
RGV
-
Femtosecond Laser Hybrid Micro-fabrication System
-
3D PCB Warpage Checker
Products you may be interested in
