DRY FILM STRIPPER
Model: GIM-1201
Category: Chemicals for Photo Litho Process
Exhibitor: AMIA CO., LTD. | PERSEE CHEMICAL CO., LTD.
Booth No: TBA
Characteristic
1.The removable liquid or semi-liquid state dry film, and the alkali-soluble ink. 2.Can be used in difficult stripping the photoresist, and may obtain a finer ink crumbs. 3.Remove photoresist; self-Over-plated Circuits has the the excellent stripped ability and high stripping rate, can be used for high-speed horizontal. 4.GIM-1201 formula contains the antirust and antifouling Point ingredients, can help prevent copper surface attack AOI inspection. 5.GIM-1201 can be used in Batch mode, when the bite fast saturation GIM-1201, if necessary, you can add the appropriate defoamers.
Other Products
-
Thermogravimetric Analysis
-
OSP LINE
-
Dry type H class Transformer
-
Routing Quality Check and Measure
-
Precious Metal Rectifier
-
8 inch Maskless Lithography System
-
In-Line Plasma Cleaning System
-
Steel panel Clean Machine
-
ArtWork AOI
-
400℃ VACUUM LAMINATION EQUIPMENT
Products you may be interested in