Double Sided Simultaneous Automatic Exposure Systems for Inner Layers
Model: ADEX1300P
Category: Exposure Machine
Exhibitor: Takewin International Co., Ltd.
Booth No: TBA
Characteristic
● 10kW scattered light sources ensure high energy output required for liquid photo resist. Also the UV intensity can be reduced to expose dry film photo resist requiring lower energy. ● High throughput over 260 panels/hour (4.4 panels/minute). ● U-contact method significantly improves the vacuum contact between photomasks and panel resulting high yield and fine resolution imaging. ● The Job change guidance and the Auto photomask placement functions minimize operator,s work to the system and guide the operator to perform the optimum and quickest setup/job change over.
Other Products
-
ArtWork AOI
-
PHASCOPE
-
Automatic Drill Bit Resharpening Machine
-
automatic vacuum packaging machine
-
DP1000-G5 Automated IC Programming System
-
Magnetic drive seal-less chemical pump
-
Vacuum Hot Press
-
Robotics
-
Universal test system, Flying Probe Test System
-
Selective Soldering Machine
Products you may be interested in
-
Whole series LED Exposure Machine
-
UV LED Exposure System
-
Fully-Automatic Uncollimated Exposure Units
-
Double Sided Simultaneous Automatic Exposure Systems for Inner Layers
-
Auto-Alignment Collimated Exposure Units (for Outer/Inner layer)
-
Optical Inspection Collimated Exposure Units (for Inner layer)
-
Auto-Alignment UV-LED Exposure Units(for inner layer / outer layer)
-
Fully-Automatic UV-LED Exposure Units (for outer layer)
-
Director Imaging Equipment
-
Full Automatic UV exposure system for patterning
-
Optical Insoection UV-LED Exposure Units(for inner layer)
-
EDM
-
Full Automatic Exposure System for High
-
Full Automatic UV exposure system for solder resist
-
Fully-Automatic Uncollimated Exposure Units(For Solder Mask)
-
Auto-Alignment Collimated light Exposure Unit (for solder mask)
-
Fully-Automatic UV-LED Exposure Units
-
Digital Imaging Exposure System
-
Auto-Alignment Scatted Exposure Units (for Solder Mask)
-
Fully-Automatic Collimated Exposure Units (For Outer Layer)
-
Fully-Automatic Collimated Exposure Units (For Inner Layer)
-
Optical Inspection Uncollimated Exposure Units (for Inner layer)
