Double Sided Simultaneous Automatic Exposure Systems for Inner Layers
Model: ADEX1300P
Category: Exposure Machine
Exhibitor: Takewin International Co., Ltd.
Booth No: TBA
Characteristic
● 10kW scattered light sources ensure high energy output required for liquid photo resist. Also the UV intensity can be reduced to expose dry film photo resist requiring lower energy. ● High throughput over 260 panels/hour (4.4 panels/minute). ● U-contact method significantly improves the vacuum contact between photomasks and panel resulting high yield and fine resolution imaging. ● The Job change guidance and the Auto photomask placement functions minimize operator,s work to the system and guide the operator to perform the optimum and quickest setup/job change over.
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NC SHEETER
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Basic Solution
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