8 inch Maskless Lithography System
Model: Raith PicoMaster XF200
Exhibitor: Microsys Engineering Co., Ltd.
Booth No: TBA
Characteristic
PicoMaster XF200 main features: - Parallel multi beam writing strategy - Down to 0.6 μm resolution - Write speed up to 280 mm2/min at 0.6 μm resolution - 256 levels of real-time grayscale lithography - Proprietary autofocus even on challenging substrates - Up to 200 x 200mm exposable area - Stitch-free exposure
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